Business Scope
Nanomaterials, semiconductor materials, high-purity materials, custom processing
Work Hours
Monday to Friday: 7AM - 7PM
Weekend: 10AM - 5PM
address
Zhengzhou, Henan, China
Titanium Disilicide, TiSi2
CAS No.: 12039-83-7
Density: 4.39 g/cm3
Molecular formula: TiSi2
Molecular weight: 104.04
Titanium disilicide product features:
Titanium silicide is widely used in the manufacture of gates, sources/drains, interconnects and ohmic contacts of metal oxide semiconductors (MOS), metal oxide semiconductor field effect transistors (MOSFET) and dynamic random access memory (DRAM); the product has high purity, small particle size, uniform distribution, large specific surface area, high surface activity and low bulk density.
| Titanium disilicide | |||
| Catalog No. | Specification | Morphology | Color |
| Ro–TiSi2–01 | 1μm | Irregular | Gray black |
| Ro–TiSi2–02 | 5μm | Irregular | Gray black |
| Ro–TiSi2–03 | 8μm | Irregular | Gray black |
| Ro–TiSi2–04 | 12μm | Irregular | Gray black |
| Ro–TiSi2–05 | 20μm | Irregular | Gray black |
| Can be customized according to customer requirements | |||
Application:
Titanium Disilicide (TiSi2), renowned for its exceptional properties, is a leading choice in various advanced applications across multiple industries. With its low film resistivity, high melting point, and remarkable chemical stability, TiSi2 has emerged as a vital material in the microelectronics sector, showcasing extensive potential for future innovations.
In the aerospace and aviation industries, Titanium Disilicide is employed in the manufacturing of high-performance components due to its ability to withstand extreme temperatures. Additionally, its robust characteristics make it suitable for applications in shipbuilding and submarine construction, where durability and reliability are paramount. The medical field also benefits from the unique properties of TiSi2, enhancing the functionality and longevity of medical devices. Moreover, its aesthetic appeal has made it a favored material in jewelry manufacturing.
Our product includes Nano Titanium Disilicide (Nano TiSi2) and Ultra-Fine Titanium Disilicide (Ultra-Fine TiSi2), providing industry professionals with superior options that cater to specific application needs. This versatility places Titanium Disilicide powder at the forefront of research and development in its respective fields, making it an increasingly significant material of interest.
Discover the advantages of Titanium Disilicide today – a superior performer distinguished by low resistivity, high temperature resistance, and excellent stability, enhancing innovation across microelectronics, aerospace, high-temperature materials, and coating applications. Embrace the future of technology with Titanium Disilicide, the pivotal element driving advancements in various high-tech industries.
